The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 28, 1999

Filed:

Jan. 12, 1998
Applicant:
Inventor:

Masahiro Mizuno, Nagoya, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
D05C / ;
U.S. Cl.
CPC ...
1121025 ; 36447009 ;
Abstract

An embroidery data processing apparatus for sewing an embroidery pattern, where an outline that defines the shape of an embroidery area intersects with itself at a point or points, the outline is divided into a plurality of segmental outlines at self-intersecting points, such that a plurality of segmental closed areas are defined by the segmental outlines. An underlying stitch area outline is established in the interior of each of the segmental closed areas, and underlying stitch data is produced for each segmental closed area. Thus, the apparatus of the invention can produce appropriate sewing data for forming underlying stitches even where the outline that defines the shape of the embroidery area intersects with itself.


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