The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 21, 1999
Filed:
Nov. 20, 1997
Nakamichi Yamasaki, Takaoka-gun, JP;
Tsuneaki Mochida, Yokohama, JP;
Akihiro Maeda, Kawasaki, JP;
Takeshi Fukuda, Kurobe, JP;
Tsuyoshi Morimura, Namerikawa, JP;
Nakamichi Yamasaki, Takaoka-gun, Kochi, JP;
YKK Corporation, Tokyo, JP;
Abstract
A method for spraying starting material particles in a continuous hydrothermal reaction, comprising spraying an aqueous fluid pressurized and heated in excess of the saturated vapor temperature and a starting material slurry pressurized at ordinary temperature. A starting material slurry feed orifice is provided in a central portion of an aqueous fluid spray orifice to spray and mix the aqueous fluid and the staring material slurry. In order to avoid entry of heat into the starting material fluid from the aqueous fluid, a heat-insulating layer is provided between feed paths for the respective two fluids. According to the above method, the starting material slurry is sprayed particularly under subcritical to supercritical conditions beyond the saturated vapor temperature to form fine particles without agglomeration thereof, whereby a hydrothermal reaction can be continuously and efficiently effected.