The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 21, 1999

Filed:

Aug. 20, 1998
Applicant:
Inventor:

Masao Futamura, Nagoya, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
D05B / ; D05C / ;
U.S. Cl.
CPC ...
1121025 ; 11247519 ; 112445 ; 36447009 ;
Abstract

A display 8 displays a plurality of embroidery regions R1 to R10 of an embroidery pattern. The user sets stitch patterns of the embroidery regions R1, R2, R5, R6 while viewing an input window IW. When the user presses a right mouse button 9a while a mouse pointer is located within the embroidery region R1, the stitch pattern of the embroidery region R1 is stored in a queue. Then by the user pressing a left mouse button while the mouse pointer is located within the embroidery region R3, the stitch pattern stored in the queue, that is, the stitch pattern of the embroidery region R1, is set as a stitch pattern of the embroidery region R3.


Find Patent Forward Citations

Futamura, Masao. (1999). Method of setting stitch pattern for embroidery region (U.S. Patent No. 5954004). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5954004

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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