The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 14, 1999

Filed:

Mar. 14, 1997
Applicant:
Inventors:

Emery O Sugasawara, Pleasanton, CA (US);

Sudhakar R Gouravaram, Fremont, CA (US);

Mandar M Dange, Milpitas, CA (US);

Assignee:

LSI Logic Corporation, Milpitas, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F / ; G06F / ;
U.S. Cl.
CPC ...
39550011 ; 382149 ; 39518313 ;
Abstract

A process for optimizing the layout of an integrated circuit (IC) design is described. The optimization process includes selecting a segment of a conductive line to be modified. The segment is selected based upon its location between a first line and a second line and is separated from these lines by unequal distances, such that the segment is close enough to the first line such that a sensitive area that is susceptible to damage from particle contamination exists. The process also includes repositioning the selected segment such that the distance between the segment and the first line is increased and the distance between the segment and the second line is decreased.


Find Patent Forward Citations

Sugasawara, Emery. (1999). Yield improvement techniques through layout optimization (U.S. Patent No. 5953518). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5953518

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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