The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 14, 1999

Filed:

Feb. 26, 1998
Applicant:
Inventors:

Seiichi Hiratsuka, Tokyo, JP;

Yukio Hoshino, Tokyo, JP;

Junichi Kunikata, Tokyo, JP;

Yoshihide Takahashi, Tokyo, JP;

Assignee:

NEC Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06K / ;
U.S. Cl.
CPC ...
382125 ; 382126 ; 34082534 ;
Abstract

To provide a stripe pattern matching system enabling to verify minutia correspondence between a searching stripe pattern and a filed stripe pattern independent of position or direction of the searching stripe pattern, correspondence value between them is evaluated by comparing their distances, directions or relations to their each neighboring minutiae by a pairing examination means (16). The most appropriate rotation angle and the most appropriate shifting coordinates for adjusting the searching stripe pattern to the filed stripe pattern is obtained by selecting a most appropriate axial candidate giving the most concentrated coordinate deviations referring to deviation distributions of correspondence values accumulated on a deviation plane memory (18) by applying each axial candidate as the coordinate adjustment reference. Therefore, the most appropriate coordinate adjustment can be performed even when either or both of absolute direction and position cannot be specified, in the invention.


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