The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 14, 1999

Filed:

Apr. 13, 1998
Applicant:
Inventors:

Arie Zigler, Rishon, IL;

Jim Galambos, Alexandria, VA (US);

Lorrin Redden, Park City, UT (US);

Michael Nelson, Murray, UT (US);

Assignee:

APTI Inc., Washington, DC (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01J / ;
U.S. Cl.
CPC ...
356326 ; 356318 ; 359508 ;
Abstract

A shutter assembly for a trace element detector includes a shutter wheel having at least one window, and a drive mechanism coupled to the shutter wheel, wherein the drive mechanism rotates the shutter wheel to move the window between at least an outlet port of the shutter assembly and a cleaning station of the shutter assembly. The cleaning station includes at least one cleaning jet positioned to apply a cleaning solution to the window when the window is located at the cleaning station. In the preferred embodiment, the shutter assembly further includes a drying station, and the drive mechanism rotates the shutter wheel to move the window to the drying station after the window has passed the cleaning station. The drying station includes at least one gas jet positioned to apply a gas stream to the window when the window is located at the drying station. A control mechanism controls the application of the cleaning fluid to the cleaning jet and the application of the gas stream to the gas jet, as either continuous flows or intermittent pulses. The cleaning station and the drying station are preferably isolated by the use of a base plate including a separating wall. The base plate is also provided with drain ports to allow excess cleaning solution to drain from the shutter assembly.


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