The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 14, 1999
Filed:
Apr. 18, 1997
Gary Lee Diven, Lancaster, PA (US);
Frank Rowland Ragland, Jr, Lancaster, PA (US);
Thomson Consumer Electronics, Inc., Indianapolis, IN (US);
Abstract
The present invention provides an improvement in a CRT (10) having a tension mask (24) and support frame assembly (35). The support frame assembly (35) is rectangular and has two long sides that parallel a central major axis thereof and two short sides that parallel a central minor axis thereof The mask (24) has a substantially cylindrical contour, being curved along the major axis and straight along the minor axis. The frame assembly (35) includes two first members (36, 38; 136, 138) that parallel the major axis and two second members (40, 42), attached to the ends of the first members, that parallel the minor axis. Each of the first members (36, 38; 136, 138) includes a rigid section (50; 150) and a compliant section (52; 152) cantilevered from the rigid section (50; 150). The compliant sections (52; 152) have a distal end (54; 154) and a proximal end (56; 156). The mask (24) is attached to the distal ends (54; 154) of the compliant sections (52; 152). The improvement comprises at least one of the compliant sections (52; 152) including an alloy portion (60; 160, 161) and a bimetal portion (58; 158) for relaxing the tension on the strands (32) of the mask (24) when subjected to an elevated temperature and restoring the tension on the strands (32) of the mask (24) at a temperature below the elevated temperature.