The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 14, 1999
Filed:
Apr. 29, 1997
Marc S Weinberg, Needham, MA (US);
Steven T Cho, Santa Clara, CA (US);
Ralph E Hopkins, III, Brookline, MA (US);
Lance C Niles, Salem, MA (US);
Anthony S Kourepenis, Acton, MA (US);
Eric M Hildebrant, Watertown, MA (US);
Paul A Ward, Roslindale, MA (US);
The Charles Stark Draper Laboratory, Inc., Cambridge, MA (US);
Abstract
Trenches which reduce or eliminate force and sensitivity associated with proof mass motion normal to the substrate as a result of voltage transients is disclosed. The trenches provide increased separation between interleaved comb electrodes and the substrate, and thereby also reduce the comb lift to drive ratio. The trenches are typically formed directly below the interleaved comb electrodes, but may also be formed below other suspended portions. Trench depth is from 6-10 microns and provides a comb electrode to substrate separation of approximately 8.5-12.5 microns.