The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 14, 1999

Filed:

Sep. 02, 1998
Applicant:
Inventors:

Cheng Yi Chen, Colonia, NJ (US);

Edward J Grabowski, Westfield, NJ (US);

Paul J Reider, Westfield, NJ (US);

Lushi Tan, Edison, NJ (US);

Richard D Tillyer, Cranford, NJ (US);

Assignee:

Merck & Co., Inc., Rahway, NJ (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C07C / ;
U.S. Cl.
CPC ...
564425 ;
Abstract

A process for enhancing the purity of 2R-�1-hydroxy-1-trifluoromethyl-3-cyclopropylpropyn-2-yl!-4-chloroaniline comprising the formation of an acid addition salt which is capable of rejecting the racemate in the selected organic solvent.


Find Patent Forward Citations

Chen, Cheng. (1999). Process for enhancing the optical purity (U.S. Patent No. 5952528). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5952528

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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