The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 14, 1999

Filed:

Jan. 13, 1998
Applicant:
Inventors:

Gangfeng Cai, West Chester, PA (US);

Jeffrey A Klang, Exton, PA (US);

Lau S Yang, Wilmington, DE (US);

Assignee:

Arco Chemical Technology, L.P., Greenville, DE (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F / ;
U.S. Cl.
CPC ...
525438 ; 528274 ; 528275 ; 528297 ; 528300 ; 528301 ; 528302 ; 528306 ; 525437 ; 525440 ; 525445 ; 525 11 ; 525 41 ; 525 42 ; 525 43 ; 524745 ; 524779 ; 521 82 ;
Abstract

A general approach to making water-resistant polyetherester resins and thermosets is disclosed. In one aspect, an unsaturated polyetherester resin prepared by inserting a carboxylic acid derivative into a polyether is co-cured with a vinyl monomer and a di- or polyisocyanate to give a water-resistant, thermoset that has excellent dimensional stability, flexibility, and strength properties. Processes for making low-viscosity resins that give thermosets with good water resistance are also described. In one process, an unsaturated polyetherester resin intermediate reacts with a mono-functional isocyanate or fatty alcohol to produce an easy-to-formulate, low-viscosity, low-molecular-weight capped resin.


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