The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 14, 1999
Filed:
May. 12, 1997
Raymond A Cutler, Bountiful, UT (US);
Ceramatec, Inc., Salt Lake City, UT (US);
Abstract
A binderless coarse-grained WC substrate is coated with a chemical vapor deposition ('CVD') diamond layer in order to give a coating with improved adherence relative to WC--Co-based substrates and high compressive residual stress relative to Si.sub.3 N.sub.4 -based substrates. The elimination of Co from the WC improves the adherence of the diamond coating, allowing thicker coatings to be produced than for WC--Co substrates. Thin coatings (<30 .mu.m) are acceptable for applications where the coating is under low applied stress. Thicker coatings (>30 .mu.m) are used to give enhanced damage resistance for stresses localized at the surface of the diamond-coated component. Applying the diamond coating to a WC/WC--Al.sub.2 O.sub.3 /WC graded composite allows materials with high damage resistance to be fabricated. Deposition of a substantially continuous diamond film may be accomplished by CVD and PVD techniques. WC ceramics allow faster deposition rates since Co in WC--Co enhances back-conversion of diamond to graphite, and diamond can therefore be deposited on WC at higher temperatures than WC--Co substrates.