The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 07, 1999
Filed:
Jun. 27, 1996
Shigeaki Shimazu, Kyoto, JP;
Souichi Kimura, Kyoto, JP;
Dainippon Screen Mfg. Co., Ltd., Kyoto, JP;
Abstract
A mask area is specified as a target area of modification in a multi-tone image. The multi-tone image is converted to a plurality of binary images with a plurality of threshold values. A plurality of density-contours corresponding to the plurality of binary images are extracted. Without implementing any contraction or expansion, a portion overlapping the contour of the mask area is deleted from each extracted density-contour. A plurality of modified density-contours which do not include the portions overlapping the contour of the mask area are converted back to a modified multi-tone image.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile