The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 07, 1999

Filed:

Jul. 01, 1991
Applicant:
Inventors:

Han S Uhm, Potomac, MD (US);

Woodrow W Lee, Potomac, MD (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G21G / ;
U.S. Cl.
CPC ...
376114 ; 376115 ; 376151 ;
Abstract

A steady-state source of neutrons is produced within an electrically grounded and temperature controlled chamber confining tritium or deuterium plasma at a predetermined density to effect implantation of ions in the surface of a palladium target rod coated with diffusion barrier material and immersed in such plasma. The rod is enriched with a high concentration of deuterium atoms after a prolonged plasma ion implantation. Collision of the deuterium atoms in the target by impinging ions of the plasma initiates fusion reactions causing emission of neutrons during negative voltage pulses applied to the rod through a high power modulator. The neutrons are so generated at a relatively high dose rate under optimized process conditions.


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