The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 07, 1999
Filed:
Dec. 30, 1996
Makoto Takagawa, Tsukuba, JP;
Ryusuke Shigematsu, Tsukuba, JP;
Kuniaki Ageishi, Kurashiki, JP;
Ko Kedo, Kurashiki, JP;
Mitsubishi Gas Chemical Company, Inc., Tokyo, JP;
Abstract
A process for producing highly pure 2,6-dimethylnaphthalene in a high yield from a mixture of dimethylnaphthalene isomers in the presence of a solvent, such as an aliphatic or alicyclic saturated hydrocarbon. Highly pure 2,6-dimethylnaphthalene can be produced steadily for a long time by filtering the 2,6-dimethylnaphthalene crystal precipitated by the crystallizing by using a filtration apparatus, such as a rotary vacuum filter, peeling-off the filtered cake from a filter cloth and cleaning the filter cloth with a solvent, at a temperature not lower than a filtration temperature.