The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 07, 1999

Filed:

Apr. 14, 1998
Applicant:
Inventor:

Sigfrid Svensson, Bryssel, BE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B65B / ; B05D / ; B32B / ;
U.S. Cl.
CPC ...
428497 ; 427154 ; 427156 ; 427384 ; 427271 ; 427287 ; 4273855 ; 4273881 ; 427336 ;
Abstract

A process for protecting a surface from non-desired contamination and for facilitating removal of said contamination from said surface, characterized by the steps: a) preparing a solution of polysaccharides containing at least two components, wherein one component is constituted by a first polysaccharide which, when precipitated from a solution by evaporation of the solvent thereof, directly forms a film and wherein the second component is constituted by a second polysaccharide which, when precipitated from a solution by evaporation of the solvent thereof, forms a film via at least partial gel formation, or by interaction with said first polysaccharide, said films being redissolvable or swellable: b) applying the solution from step a) onto said surface before subjected to contamination: c) allowing the applied solution to dry so as to form a solid film on said surface via at least partial gel formation: d) treating the film-coated surface with a liquid capable of redissolving film or provided swelling thereof: and e) removing the non-desired contamination by complete or partial removal of the film from the surface.


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