The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 31, 1999
Filed:
May. 19, 1997
Robert W Rudeen, Eugene, OR (US);
Spectra-Physics Scanning Systems, Inc., Eugene, OR (US);
Abstract
An optical system and method for data reading in which a light source generates an optical beam directed toward an object to be read and a variable aperture mechanism positioned in the outgoing light path establishes at least two separate focal planes. The variable aperture device may comprise a variable aperture system in which the size of the aperture is selectively varied about a range within the diffractive limit of the light beam. A preferred aperture mechanism is an electronically actuable mechanism with no moving parts which may include a liquid crystal aperture with one or more aperture regions which are selectively or consecutively activated. The optical system therefore establishes two or more separate waist locations from a single light source resulting in greater depth of field or multiple depths of field.