The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 31, 1999
Filed:
Nov. 07, 1996
Applicant:
Inventors:
Akira Isobe, Tokyo, JP;
Tomotake Morita, Tokyo, JP;
Assignee:
NEC Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B / ;
U.S. Cl.
CPC ...
451288 ; 451285 ; 451398 ;
Abstract
A polishing apparatus has a retainer for retaining a semiconductor wafer on a polishing pad, and the outer periphery of the retainer ring is rounded so as to minimize a deformation produced in the polishing pad, thereby improving the surface profile of the semiconductor wafer.
Isobe, Akira. (1999). Polishing apparatus having retainer ring rounded along outer periphery (U.S. Patent No. 5944590). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5944590
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile