The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 24, 1999

Filed:

Jun. 04, 1998
Applicant:
Inventors:

Makoto Ryoji, Kitasouma-gun, JP;

Masakuni Tokai, Noda, JP;

Yukitaka Mori, Noda, JP;

Takeshi Hasegawa, Noda, JP;

Masahito Ban, Noda, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J / ; H05H / ;
U.S. Cl.
CPC ...
31511121 ; 31511171 ; 1187 / ; 31323131 ;
Abstract

The present invention provides an electron-beam excited plasma generator which can effectively form samples of larger areas. The electron-beam excited plasma generator according to the present invention comprises a cathode (11) for emitting thermions; a discharge electrode (23) for gas discharge between the cathode and the same; an intermediate electrode (13) positioned coaxially with the discharge electrode in an axial direction; a discharge chamber (2) to be filled with discharge gas plasma generated by the gas discharge between the cathode and the discharge electrode; a plasma processing chamber (3) formed adjacent to the discharge chamber with a partition wall (21) disposed therebetween and positioned so that a surface-to-be-processed of a workpiece-to-be-processed (35) is positioned perpendicular to the axial direction; a plurality of orifices (22) for pulling out electrons in the discharge gas plasma in the discharge chamber into the plasma processing chamber, each being formed in the partition wall substantially perpendicular to the axial line and distributed radially with respect to the axial direction; and an accelerating electrode (31) disposed in the plasma processing chamber for pulling out and accelerating the electrons through the orifices.


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