The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 24, 1999
Filed:
Nov. 27, 1996
Applicant:
Inventors:
Ronald Hiskes, Palo Alto, CA (US);
Rene P Helbing, Palo Alto, CA (US);
Stephen A DiCarolis, Santa Clara, CA (US);
Assignee:
Hewlett-Packard Company, Palo Alto, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
4272556 ; 117104 ;
Abstract
A method for depositing a thin film including a sulfide of a metal on a substrate. First and second vapor streams are generated and combined in the vicinity of the substrate. The first vapor stream includes an organic compound containing the metal is generated. The second vapor stream includes a mercaptan. The preferred mercaptan is tertrary-butyl-mercaptan. The preferred metal precursor is a .beta.-diketonate of the metal.