The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 17, 1999

Filed:

Sep. 06, 1996
Applicant:
Inventors:

Warren D White, Lake Jackson, TX (US);

Muhammed A Shafi, Lake Jackson, TX (US);

Assignee:

Other;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F / ;
U.S. Cl.
CPC ...
364578 ; 36447508 ; 36447601 ; 264 401 ;
Abstract

A system and method for simulating LCM mold filling utilizes at least one processor, suitable RAM and storage memory, a data input, a display, and logic for simulating the injection of resin into a mold cavity containing a preform based upon mold cavity design parameters, mold filling processing parameters, physical property parameters, and system processing parameters, and identifying the current state of selected mold filling conditions at selected points in time during the simulated mold filling process. The system logic includes an error estimator for periodically estimating the error in the flux computations, preferably during each iteration in the solution of the governing equations. The system also preferably includes predictor/corrector logic which modifies a variable relaxation parameter and a variable convergence tolerance, based upon the estimated error and other predefined computational thresholds to urge rapid convergence to a correct solution of the governing equations in an efficient manner. The system also preferably includes logic for allowing the operator to modify one or more process parameters while the simulation is in process, so that the simulation may continue utilizing the modified process parameters thereby obviating the need to repeatedly re-run the simulation with changed process variables.


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