The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 17, 1999
Filed:
Nov. 19, 1997
Chang-su Lim, Kyonggi-do, KR;
Hyun-joon Kim, Kyonggi-do, KR;
Youn-soo Han, Kyonggi-do, KR;
Ok-sun Lee, Kyonggi-do, KR;
Samsung Electronics Co., Ltd., Suwon, KR;
Abstract
A method and an apparatus for testing the filtration efficiency of cloth materials intended for use as garments, masks, or gloves in a clean room environment where semiconductor chips are fabricated. The apparatus includes a support for holding the sample of cloth material to be tested; a gas ionizer for introducing an ionized gas into a chamber; an optional humidifier for introducing water vapor into the chamber; a particle generator for introducing particles into the chamber; and a particle counting assembly for counting the number of particles introduced into the chamber before and after they pass through the sample of cloth material being tested. Particles are introduced into the chamber after the static in the chamber has been removed by ionized gas, and the temperature and humidity in the chamber have been optionally adjusted. Filtration efficiency is determined by counting the total number of particles introduced into the chamber and the number of particles that pass through a sample of cloth material. Based on the filtration efficiency, the useful life of dust free clothes made out of the cloth material and worn by clean room operators can be determined.