The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 17, 1999
Filed:
Nov. 12, 1996
Tsutomu Onuma, Hitachi, JP;
Toshimi Matsumoto, Hitachinaka, JP;
Akira Onuma, Hitachi, JP;
Mitsuo Nakamura, Takahagi, JP;
Choichi Asano, Hitachi, JP;
Yasumasa Tamai, Hitachi, JP;
Hiroo Koide, Hitachiota, JP;
Masayuki Kurihara, Hitachi, JP;
Takao Funamoto, Hitachi, JP;
Fuminori Ishikawa, Hitachiota, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A submerged laser beam irradiation equipment provides a high quality submerged laser beam processing of a submerged workpiece using only a small amount of a gas. The submerged laser beam irradiation equipment has: a focus lens for focusing a laser beam; a mirror tube which houses the lens; a first nozzle operating to cover the front end of the mirror tube in an irradiating direction of the laser beam; a skirt portion provided at the front end of the first nozzle for preventing water intrusion thereinto; and a shutter mechanism operable to open and close and provided between said skirt portion and said mirror tube for preventing water intrusion into said mirror tube.