The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 10, 1999
Filed:
Nov. 07, 1996
Applicant:
Inventor:
Yoshiki Nagatomo, Tokyo, JP;
Assignee:
OKI Electric Industry Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
438443 ; 438444 ; 438448 ; 438439 ;
Abstract
A method of forming an isolation region exerts no adverse influence upon steps after forming the isolation region and is, besides, capable of forming the isolation region having a narrow isolation width. After a mask has been formed of an oxidationproof material such as Si.sub.3 N.sub.4 on a silicon substrate, a field oxide is formed by effecting selective oxidation in a high-pressure dry oxygen atmosphere. Thereafter, a portion, protruded from the silicon substrate, of the formed field oxide is removed, thereby forming the isolation region.