Method for converting an integrated circuit design for an upgraded

Abstract

A method for converting an original integrated circuit (IC) design to an updated IC design for an updated manufacturing process includes accessing a mask database for the original IC design and manipulating the data by various scaling steps and other modifications. The original IC design may include contacts so the method includes the steps of performing a first downward size scaling on the mask data to scale down the original IC design, and selectively performing a second downward size scaling on the mask data to further scale down the contacts. The step of selectively performing the second downward size scaling may preferably include the steps of displaying and viewing an image of the IC design to aid in selection. The vias of the IC design may also be scaled downward. The method may also further include the step of selectively performing a downward size scaling on the mask data in at least one dimension to further scale down a size of the polysilicon gates. The method may further include the steps of selectively performing an upward size scaling on the mask data to scale up the power supply rails, and selectively performing an upward size scaling on the mask data to scale up the bond pads. The original test and alignment structures are preferably replaced by new test structures and alignment keys for the updated process, and new ESD protection may be substituted for the original ESD protection.