The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 10, 1999
Filed:
Feb. 09, 1998
McDonnell Douglas Corporation, St. Louis, MO (US);
Abstract
A support member for a measurement chamber, which measurement chamber surrounds a target of interest intersected by a line defined by focal points associated with the measurement chamber, and which chamber separates and extracts unwanted scattered signals from the measurement chamber, the measurement chamber including a chamber section having an interior defined by rotation of a nonlinear curve about the line, and first and second focusing elements which couple the scattered signals out of the chamber section, includes a surface for attaching at least one of the target of interest and a source generating signals scattered by the target of interest and a sting element which is coaxial with the line and which is coincident with one of the focal points. According to one aspect of the present invention, the source is attached to the surface and supported by a sting element which is defined a body of rotation about the line. According to another aspect of the present invention, the target of interest, which is disposed between the source and the sting element, is attached to the surface. Preferably, selected surfaces of the support element are covered by radar absorbing material. According to another aspect of the present invention, first and second support elements are provided to support the source and target of interest, respectively. Low RCS measurement chambers and systems are also described.