The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 10, 1999
Filed:
Jul. 09, 1997
Abstract
An X-ray, neutron or electron diffraction method, which is devoid of the defects of conventional diffraction apparatus using an imaging plate, which can analyzing a sample, in a non-destructive mode without contact and with a good S/N ratio, even when the sample significantly generates fluorescence or scattered X-rays. The method includes the steps of irradiating a predetermined area of the sample with an X-ray, neutron or electron beam whose axis is oriented at a fixed direction to obtain a diffraction ray, rotating the sample while maintaining the irradiated predetermined area substantially unchanged and while maintaining the angle between the axis of the X-ray, neutron or electron beam relative to the tangential plane of the predetermined area substantially unchanged, forming an image of the diffraction ray from the sample during the rotation of the sample through every predetermined angle using an imaging plate, reading a data of the image formed on the imaging plate to obtain an output data for each rotation of the sample through the predetermined angle, and processing the output data to obtain desired analysis information.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile