The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 10, 1999
Filed:
Oct. 07, 1997
Applicant:
Inventors:
Edward A Beam, III, Dallas, TX (US);
Andrew J Purdes, Garland, TX (US);
Assignee:
Texas Instruments Incorporated, Dallas, TX (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C / ; C23C / ;
U.S. Cl.
CPC ...
427100 ; 42725519 ; 42725531 ; 42725534 ; 427255394 ; 4272557 ; 427576 ; 20419218 ; 20419222 ;
Abstract
A method is provided for forming a piezoelectric layer with improved texture. In the method, a seed material is deposited on a substrate (12) at a low deposition rate to form a seed layer (16). The low deposition rate may be a rate in the range of 10.0-150 nanometers per hour. A piezoelectric material is deposited on the seed layer at a high deposition rate to form a bulk piezoelectric layer (20) having improved texture. The high deposition rate can be a rate in the range of 500-5000 nanometers per hour.