The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 10, 1999
Filed:
Feb. 20, 1997
Applicant:
Inventors:
Vinci Martinez Felix, Kennett Square, PA (US);
George Paskalov, Los Angeles, CA (US);
Assignees:
E. I. du Pont de Nemours and Company, Wilmington, DE (US);
Plasma Plus, Van Nuys, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C01B / ;
U.S. Cl.
CPC ...
204164 ; 423507 ;
Abstract
A process is disclosed for converting hydrogen chloride (HCl) to molecular chlorine (Cl.sub.2) and molecular hydrogen (H.sub.2), and more particularly to such process conducted in a plasma environment.
Quick Actions:
Felix, Vinci. (1999). Producing chlorine and hydrogen from hydrogen chloride by plasma process (U.S. Patent No. 5935390). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5935390
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile