The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 10, 1999
Filed:
Mar. 11, 1997
Makoto Kashiwaya, Kanagawa, JP;
Junji Nakada, Kanagawa, JP;
Fuji Photo Film Co., Ltd., , JP;
Abstract
A film-forming apparatus for making it possible to form a thin film on a web-like high-molecular film substrate, comprising: a vacuum chamber provided with an evacuator; a gas introducing member for introducing a thin-film-forming gas into the vacuum chamber; a plasma generating member for generating plasma in the vacuum chamber; a substrate carrying member for carrying the substrate to the neighborhood of the plasma generated by the plasma generating member; and a bias voltage applying member for applying a desired bias voltage to the substrate. The plasma generating member is constituted by a microwave ECR plasma generating member including a microwave generating member for generating microwave, a microwave introducing and propagating member for coaxially introducing the generated microwave into the vacuum chamber and radially propagating the microwave in the vacuum chamber, and permanent magnets provided in the vacuum chamber for forming a magnetic field to cause electron cyclotron resonance with the introduced and propagated microwave.