The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 03, 1999
Filed:
Nov. 12, 1996
Atlantic Richfield Company, Los Angeles, CA (US);
Abstract
A method and computer system for deriving and applying normal moveout phase and time shift corrections to seismic survey traces is disclosed. Normal moveout time-shift corrections are first applied to traces in a common midpoint (CMP) or common depth point (CDP) gather, based upon stacking velocity analysis applied to envelopes of the traces. One offset in the survey, preferably the maximum offset, is selected as the reference point; the NMO time shift at this reference offset is then selected as a reference NMO time-shift. The traces in the gather are each phase-shifted based upon iterated reference phase dispersion values at the reference offset, times the ratio of the normal moveout time-shifts for the trace in the gather to that of the reference offset (raised to a power). Semblance analysis is performed to identify, for each point in normal incidence time and thus for each reflective event, the optimum reference phase dispersion value. Phase corrections, based upon the optimum reference phase dispersion value as a function of normal incidence time multiplied by the ratio of the normal moveout trace and reference time shifts, are then applied to the traces in the gather. Interpolation may be used to define the optimum reference phase dispersion for CMP gathers lying between the midpoints of analyzed gathers.