The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 03, 1999

Filed:

May. 24, 1996
Applicant:
Inventors:

Matthias Hartrumpf, Karlsruhe, DE;

Roland Munser, Karlsruhe, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N / ;
U.S. Cl.
CPC ...
324642 ; 324637 ; 324 67 ;
Abstract

A process for detecting totally or partially hidden faults, such as cracks, and bubbles and the like in an opaque medium, by using microwave radiation. Microwaves from a transmitting antenna are directed against the surface of the medium which is to be inspected, and microwave radiation reflected or back scattered from the medium is detected and analyzed. In order to maximize the signal to noise ratio, minimizing the detection of radiation reflected by the surfaces of the medium itself, at least one of the transmitting antenna and the receiving antenna is oriented at an oblique angle relative to the surface of the medium.


Find Patent Forward Citations

Hartrumpf, Matthias. (1999). Process for detecting totally or partially hidden non-homogeneities by (U.S. Patent No. 5933014). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5933014

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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