The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 03, 1999
Filed:
Sep. 15, 1997
Applicant:
Inventors:
Hiroyuki Akatsu, Yorktown Heights, NY (US);
Ronald Hoyer, Poughkeepsie, NY (US);
Ravikumar Ramachandran, Beacon, NY (US);
Assignee:
International Business Machines Corporaiton, Armonk, NY (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
438745 ; 134-2 ; 134 26 ; 216 99 ; 438748 ;
Abstract
Formation of watermarks during semiconductor processing can be prevented by rinsing silicon wafers in an organic solvent prior to drying. Water droplets on the silicon wafer surface are taken up by the solvent and film is formed over the wafer surface. Following this rinse, the wafer may be subjected to standard IPA-based drying techniques.