The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 03, 1999
Filed:
Jul. 11, 1997
Yasuhiko Takeda, Aichi-ken, JP;
Tomoyoshi Motohiro, Seto, JP;
Tatsumi Hioki, Nagoya, JP;
Shoji Noda, Aichi-ken, JP;
Mikio Okamoto, Yokohama, JP;
Hiroshi Niikura, Kanagawa-ken, JP;
Kabushiki Kaisha Toyota Chuo Kenkyusho, Aichi-ken, JP;
Nikon Corporation, Tokyo, JP;
Abstract
By providing a normally deposited layer as a buffer layer between a substrate and an obliquely deposited layer, it is possible to prevent contaminants on the substrate from diffusing into the obliquely deposited layer. Also, by providing a normally deposited layer as a passivation layer on the uppermost obliquely deposited layer, absorption of water vapor in the air by the obliquely deposited layer is prevented. Further, by forming a laminated object comprising obliquely deposited layers and dense normally deposited layers, strength of each obliquely deposited layer itself is increased and relaxation of its columnar structure can be suppressed with certainty because both the diffusion of contaminants from the substrate and the absorption of water in the air is prevented. Thus, by removing factors to accelerate the relaxation of columnar structure in the obliquely deposited layer, clouding of the obliquely deposited film layer can be prevented.