The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 03, 1999

Filed:

May. 01, 1998
Applicant:
Inventor:

Yoshinobu Kaneyama, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
4271632 ; 427226 ; 427387 ;
Abstract

Disclosed is a method for fabricating SiO.sub.2 film used as the core layer or cladding layer of an optical waveguide that has the steps of: coating a polysilazane solution on a substrate; and sintering the substrate at a predetermined temperature to form SiO.sub.2 film on the substrate by using the pyrolysis reaction from polysilazane to SiO.sub.2.


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