The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 27, 1999
Filed:
Aug. 01, 1997
Applicant:
Inventors:
Bryan Chaeyoo Chung, Bethlehem, PA (US);
Charles Walter Pearce, Emmaus, PA (US);
Assignee:
Other;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
438448 ; 438753 ; 216 99 ;
Abstract
Semiconductor integrated circuit processing is facilitated by an etch process illustratively applied to polysilicon and silicon nitride removal. The etch process illustratively comprises of the use of phosphoric acid with metal-containing additives to bring about an enhanced silicon etch rate effect.