The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 27, 1999
Filed:
Oct. 31, 1997
Robert L Lamberts, Penfield, NY (US);
Other;
Abstract
A method for forming a test object containing a sinusoidal pattern corresponding to a specified exposure distribution function comprises: providing an exposed and processed intermediate photographic film containing a distorted sinusoidal pattern image having harmonics necessary to produce a substantially undistorted sinusoidal pattern in an exposed and processed test object photographic film; exposing the test object film using the intermediate film containing the distorted sinusoidal pattern image; and processing the exposed test object film, thereby forming a test object containing a substantially undistorted sinusoidal test pattern.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile