The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 27, 1999
Filed:
Sep. 30, 1997
Applicant:
Inventors:
Kai Huckels, Poughkeepsie, NY (US);
Matthias Ilg, Fishkill, NY (US);
Assignee:
Siemens Aktiengesellschaft, Munich, DE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
438691 ; 438692 ; 438702 ;
Abstract
Fabrication of devices that produces a surface with reduced dishing caused by polishing. The reduced dishing is the result of forming a first layer that partially covers a complex surface topography and a second layer the covers the surface topography. The second layer being more resistant to polishing than the first so as to reduce dishing in the wide spaces of the complex topography.
Huckels, Kai. (1999). Dishing resistance (U.S. Patent No. 5928959). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5928959
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile