The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 27, 1999
Filed:
Nov. 12, 1997
Shuji Takeshita, Kawasaki, JP;
Fujitsu Limited, Kawasaki, JP;
Abstract
A method of exposing a photoresist layer deposited on a substrate uses an exposure mask having transparent and opaque regions defined on a mask substrate and a transition region defined on said mask substrate between said transparent region and said opaque region. The transition region comprises a plurality of opaque patterns having respective sizes and disposed with respective mutual separations such that said transmission region has a gradually increasing transmittance proceeding from said opaque region to said transparent region. The exposed photoresist layer is developed to form a resist pattern and the resist pattern is converted into an insulation pattern by conducting a baking process.