The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 20, 1999

Filed:

Dec. 23, 1997
Applicant:
Inventors:

Sang Ho Woo, Ichon, KR;

Seong Su Lim, Seoul, KR;

Il Keoun Han, Ichon, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
438260 ; 438964 ; 438398 ;
Abstract

This invention discloses a method of forming an electrode of semiconductor device. In the present invention, an amorphous silicon film is formed on a substrate, and silicon seeds are formed on the silicon film. Thereinafter, the heat treatment is performed for growing, thereby forming an hemispherical roughness structure on surface of said charge storage electrode and increasing a surface area in unit area.


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