The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 20, 1999
Filed:
Dec. 29, 1997
Matthias Mandl, Ammerthal, DE;
Wolfgang Keupp, Munchen, DE;
Peter Czekal, Munchen, DE;
Friedrich Jacob, Munchen, DE;
AGFA-Gevaert AG, Leverkusen, DE;
Abstract
A master to be copied has a picture in which a dark region and a light region are located one behind the other. The two regions are separated by a light/dark transition where a halo can develop on copies of the master. Prior to copying, the master is scanned and the resulting data used to produce a mask for the master. The mask has a light/dark transition corresponding to the light/dark transition of the master. However, the light/dark transition of the mask is shifted relative to the light/dark transition of the master. The shift is such that, when the mask is superimposed on the master, the light/dark transition of the mask is superimposed on a region of the master which reduces the visibility of the halo. The master is copied following masking.