The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 20, 1999
Filed:
Jan. 23, 1998
Applicant:
Inventor:
Dan I Hariton, Pinole, CA (US);
Assignee:
National Semiconductor Corporation, Santa Clara, CA (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
327581 ; 327566 ; 257312 ; 257296 ;
Abstract
A structure is provided to create a voltage-independent capacitive structure using a typical MOS fabrication process. The capacitive structure includes two FET devices connected in series by having their source, drain, and body terminals all coupled together into a common node. A biasing circuit that includes a current generator and a current mirror biases the common node so that a constant capacitance is maintained across the gate terminals of the two serially connected FET devices, independent of the applied voltage.