The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 20, 1999

Filed:

May. 30, 1997
Applicant:
Inventors:

Long-Li Lai, Taichung, TW;

Ting-Chung Liu, Hsinchu, TW;

Teu-Yu Lin, Hsinchu Chen, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F / ;
U.S. Cl.
CPC ...
5253594 ; 5253288 ; 525383 ; 525386 ;
Abstract

The present invention provides a process for preparing a polyhydroxystyrene derivative, comprising adding polyhydroxystyrene to an alkaline alcohol solution to form a homogeneous polyhydroxystyrene solution; and reacting the polyhydroxystyrene solution with an ester to obtain the polyhydroxystyrene derivative. The obtained polyhydroxystyrene derivative is suitable for use as the resin component of a photoresist.


Find Patent Forward Citations

Loading…