The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 20, 1999

Filed:

Oct. 02, 1997
Applicant:
Inventors:

Yutaka Tokiwa, Tsuchiura, JP;

Hiroyuki Jikuya, Tsukuba, JP;

Naoko Nagai, Kameoka, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C12N / ; C07C / ;
U.S. Cl.
CPC ...
4352521 ; 435262 ; 435882 ; 435884 ;
Abstract

A microorganism belonging to the genus Staphylococcus or the genus Streptomyces which is capable of degrading a polylactic acid resin. A method of degrading a polylactic acid resin including a step of culturing a microorganism capable of degrading a polylactic acid resin in a medium containing a polylactic acid resin. In particular, the microorganisms Staphylococcus hominis FERM BP-6108 and Staphylococcus epidermidis FERM BP-6109.


Find Patent Forward Citations

Tokiwa, Yutaka. (1999). Method of degrading polylactic acid resin using staphylococcus hominis (U.S. Patent No. 5925556). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5925556

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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