The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 20, 1999

Filed:

Jun. 16, 1997
Applicant:
Inventors:

Thap DoMinh, Rochester, NY (US);

Paul R West, Ft. Collins, CO (US);

Jeffery A Gurney, Greeley, CO (US);

John Kalamen, Loveland, CO (US);

Christopher J Kloxin, Greeley, CO (US);

Assignee:

Kodak Polychrome Graphics LLC, Norwalk, CT (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ; G03F / ; G03F / ;
U.S. Cl.
CPC ...
4302781 ; 4302831 ; 4302851 ; 4302731 ;
Abstract

A photosensitive composition can be used to prepare negative-working photosensitive elements such as lithographic printing plates. The composition includes a first photocrosslinkable aromatic resin having photocrosslinkable groups and a number average molecular weight of at least about 1500. Also included is a mixture of a polyalkyleneglycol diacrylate and polyacrylate polymerizable monomers, a photocrosslinkable polyester, a photoinitiator, and a photosensitizer. The photosensitive resins are present at a total weight ratio to the polymerizable monomers of at least 1.5:1.


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