The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 13, 1999
Filed:
Oct. 14, 1998
Masayuki Takeuchi, Shiga-ken, JP;
Shinya Nakagawa, Shiga-ken, JP;
International Business Machines Corporation, Armonk, NY (US);
Abstract
A film deposition apparatus and a method thereof for accurately forming a film of a given thickness on the surface of a wafer is described. The film deposition apparatus includes a laser beam to perform a precise in-situ monitoring of a change in thickness of the film being deposited on the surface of the wafer. An optical guide is provided in an attachment coupled to the quartz furnace of a chemical vapor deposition apparatus. A laser beam is introduced into the quartz furnace through the optical guide, and is projected onto the wafer. The laser beam reflected by the wafer is channeled through the same optical guide to be discharged to the outside of the quartz furnace. A change in thickness of the film is monitored based on the strength of the reflected laser beam. In this manner, the laser beam can be transmitted without passing through the wall of the quartz furnace, and the thickness of the film can be accurately monitored without the process being affected by the thin film deposited on the internal wall of the quartz furnace.