The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 13, 1999
Filed:
Oct. 23, 1997
Dao-Yang Huang, Hsinchu, TW;
Chao-Tsang Wei, Taipei, TW;
Industrial Technology Research Institute, Hsinchu, TW;
Abstract
A plasma-polymerized anti-fogging film is formed by polymerization-depositing a high molecular polymerized DMDAS film on a substrate to provide the substrate surface with anti-fogging capability. The plasma polymerization deposition process is performed by using diacetoxy silane monomer that contains bi-carboxylate O.dbd.C--O-- functional group as the reactant monomer with an introduction of a suitable amount of oxygen to cause the polymerization reaction. The reactant monomer and the oxygen are introduced into a vacuum deposition apparatus and a high energy plasma is generated between electrodes of the vacuum deposition apparatus to cause the polymerization reaction on the substrate to form thereon the high molecular polymerized DMDAS anti-fogging film.