The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 13, 1999

Filed:

Aug. 15, 1997
Applicant:
Inventors:

Ryota Koike, Tokorozawa, JP;

Yukio Miya, Kawagoe, JP;

Osamu Sugiyama, Tokorozawa, JP;

Takashi Toida, Tokyo, JP;

Toshiichi Sekine, Kamifukuoka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ; B05D / ; C23C / ;
U.S. Cl.
CPC ...
427577 ; 427237 ; 427238 ; 427239 ; 427249 ; 427122 ;
Abstract

An auxiliary electrode which is to be connected to a ground potential or applied with a positive DC voltage is disposed in a center bore which forms an inner surface of a guide bush, and a ringlike dummy member made of a conductive material having an internal diameter equal to or larger than the diameter of the center bore of the guide bush with its both ends having a different diameter is placed on an end face of the guide bush opening the inner surface thereof so that one end having the smaller diameter contacts the end face of the guide bush with its center in alignment with the central axis of the center bore. A DLC film is formed over an inner surface of a guide bush which is in sliding contact with a workpiece held in the guide bush by disposing the guide bush in a vacuum vessel after evacuating the vessel and introducing a gas containing carbon, producing a plasma in a vacuum vessel by applying a DC voltage or a radio frequency power to the guide bush by the plasma CVD process.


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