The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 13, 1999
Filed:
Oct. 20, 1997
Applicant:
Inventors:
Richard J Mitro, San Ramon, CA (US);
Reza Alani, Pleasanton, CA (US);
Leszek Malaszewski, Walnut Creek, CA (US);
Assignee:
Gatan, Inc., Pleasanton, CA (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
20429804 ; 20419211 ; 20429836 ; 20419234 ;
Abstract
An apparatus and process for the etching and coating of samples in a single vacuum chamber, thus minimizing handling and transfer of the samples is provided. The apparatus includes a sealed chamber and a vacuum pump for forming and maintaining a vacuum in the chamber, a first ion gun positioned in the chamber to etch a sample, a sputtering target in the chamber, and at least one additional ion gun positioned in the chamber to cause material from the target to be directed onto the sample.