The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 29, 1999
Filed:
Mar. 15, 1996
Applicant:
Inventors:
Chinchuan Chiu, New City, NY (US);
Philip Paolella, Waldwick, NJ (US);
Michael Leary, Penn Hills, PA (US);
Joseph A Marcanio, Greensburg, PA (US);
Fusao Ishii, Pittsburg, PA (US);
Assignees:
Sony Corporation, Tokyo, JP;
Sony Electronics, Inc., Park Ridge, NJ (US);
Primary Examiner:
Int. Cl.
CPC ...
G06K / ;
U.S. Cl.
CPC ...
382149 ; 382204 ; 348125 ;
Abstract
Apparatus for detecting etch defects in an object having a plurality of openings by generating an image signal of the object representing light intensity values of a plurality of pixels, processing the image signal to form data signals representing light intensity values of groups of pixels, filtering the data signals to remove signals representing the ends of the openings, and pairing two data signals when the groups of pixels represented thereby represent an etch defect.