The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 29, 1999
Filed:
Aug. 28, 1997
Ryuichi Ebinuma, Tokyo, JP;
Tosiya Asano, Utsunomiya, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A scan type exposure method and apparatus in which a projection optical system projects, at a projection station, a portion of a pattern of an original onto a region on a substrate, an original stage moves the original relative to the projection optical system in an original scanning direction, a first substrate stage moves the substrate relative to the projection optical system in a substrate scanning direction, a second substrate stage moves the substrate relative to the projection optical system in an optical axis direction of the projection optical system, a synchronism controller controls, in the projection of the original onto the substrate through the projection optical system, synchronism between the movement of the original stage in the original scanning direction and the movement of the first substrate stage in the substrate scanning direction, a measuring device measures a position of the surface of the substrate with respect to the optical axis direction at a measurement point spaced from the projection station of and a stage controller controls, in the control of the synchronism between the movement of the original stage and the movement of the first substrate stage through the synchronism controller, movement of the substrate stage through the second substrate stage on the basis of a measured value of the measuring device and of a correction value for correcting an error produced with movement of the first substrate stage from the measurement point to the projection station over a portion of the substrate to be measured.